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CP4000化學(xué)拋光機(jī)

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更新時(shí)間：2023-04-11

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Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require ......

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Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require the use of specialised corrosive resistant equipment.

The CP4000 has been designed exactly for this application, and utilises a chemical etch polishing process to produce high quality results with minimal subsurface damage.

Ø Corrosive Resistant Construction

Ø Workdecks

Ø Polishing Plate

Ø Industry Standard System Architecture

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CP4000化學(xué)拋光機(jī)

Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require the use of specialised corrosive resistant equipment.

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